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Stacked nanosheet transistors promise to extend silicon’s reign beyond the finFET era. Put in perspective, 2D semiconductors have a long way to go. While silicon nanosheets are optimizing potential manufacturing processes, TMD semiconductor researchers are still answering questions about film fabrication and contact formation. As shrinking transistors demand thinner and thinner channels, though, the opportunity for 2D materials eventually will come.
Technologies such as gate-all-around FETs and
neuromorphic analog memory will increase
speed and reduce power consumption in the
chiplets that control artificial intelligence
of things devices and systems.
Novel properties of 2D materials can create smaller, lower-powered logic and memory devices for commercial manufacturing of integrated circuits (IC). The ongoing challenge for High-Volume Manufacturing (HVM) is to find the right precursor materials and process recipes to stack one atomic layer at a time across silicon wafers using Original Equipment Manufacturer (OEM) tools.
The ferroelectric effect in materials has been
exploited to fabricate (fab) reliable
Ferroelectric Random Access Memories (FRAM)
Non-Volatile Memory (NVM) ICs for over 20
years. Recent years have seen have seen a
breakthrough in discovering ferroelectric
properties in Hafnium Oxide (HfO2 or
“hafnia”), a fab-friendly material unlike
previous perovskite-based materials like Lead
Zirconate Titanate (PZT). This has the
potential to revolutionize on-chip memory
technology and to enable next-generation
technologies such as artificial synapses for
compute-in-memory (CIM) type neuromorphic
ICs.
The need for more energy-efficient automated inference in our world requires innovation to facilitate Sensing-to- Action and true edge intelligence for the AIoT. Analog neuromorphic ICs should consume a thousand- to a million times less energy compared to the best digital AI chips today. Leading semiconductor fabricators are in hot pursuit of new analog materials, processes and devices to find the foundations for future ML and AI systems.
Physica Status Solidi (RRL)-Rapid Research Letters – May 17, 2021
We take great pleasure to present this Focus
Issue in Physica Status Solidi (RRL) –
Rapid Research Letters on two
classes of novel ferroelectrics with rich
physics and high application potential:
fluorite- and wurtzite-type ferroelectrics
with HfO2/ZrO2 and Al(Sc)N as their most
prominent representatives.
Earlier in 2019, phase change memory (PCRAM)
was touted as one of three emerging memories
to watch. Intermolecular's CTO Karl Littau
said PCRAM still doesn’t scale as well as the
manufacturing technologies for vertical 3D
NAND because it must be built up layer by
layer, each with its own critical lithography
and etching steps
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