显示 51 - 60 条结果，共 232 条结果。
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TBTEMT
TBTEMT is a liquid precursor for CVD or ALD tantalum oxide and nitride thin films depositions.
Metal NitridesChinaEuropeJapanKoreaTaiwanLogicSemiconductors -
Uresolve™ 411 Urethane Conformal Coating Removal Solvent
Uresolve™ 411 Urethane Conformal Coating Removal Solvent is a formulated solvent used to remove urethane conformal coatings from printed circuit boards (PCBs) and other devices in the electronics industry.
Polymer Removal ChemistriesChinaJapanKoreaTaiwanElectronicUresolve™ -
BPS-170
BPS-170 aqueous copper oxide remover reduces contact resistance during probe/test, reduces the oxide thickness on aged flip chip bumps, and serves as a replacement for copper and aluminum microetch.
Litho CleansChinaEuropeJapanKoreaTaiwanSemiconductors -
Developers
AZ® developers are high contrast, ultra-high purity, and formulated for a wide range of lithography applications.
DevelopersChinaEuropeJapanKoreaTaiwanSemiconductorsAZ® -
S-1087 Exhausted Work Station
Our S-1087 Exhausted Work Station is a self-contained, manual work station is designed to perform part cleans and rinses in an exhausted environment.
Parts and Carrier CleansChinaEuropeJapanKoreaTaiwanElectronicEquipmentIndustrialLogicSensors (MEMS, Optoelectronics) -
TEOS
Tetraethyl Orthosilicate (TEOS) is used as a semiconductor silicon source for the Thin Film Deposition of doped and undoped silicon dioxide films.
DielectricsChinaEuropeJapanKoreaTaiwanDisplayLogicSemiconductors -
Advanced Oxide CMP slurries: STI Selective Oxide CMP, HPD Selective Oxide CMP
Our Advanced Oxide CMP products are Highly Selective Oxide Slurry family with Stop-on-Film capability.
Advanced PackagingFEOL DielectricsChinaEuropeJapanKoreaTaiwanLogicSensors (MEMS, Optoelectronics)DA Nano®Cerium -
TMG
Trimethylgallium (TMGa) is the most widely used source for GaAs MOVPE.
MetalsOther DopantsChinaEuropeJapanKoreaTaiwanLogicSemiconductors -
ACT® BHP851
ACT® BHP-851 is fluoride-containing product specially formulated for effective removal of post-etch and ash residue during BEOL Cu integration.
AI IC CleansChinaEuropeJapanKoreaTaiwanSemiconductorsACT® -
ZrCl4
ZrCl4 is r solid ALD precursor for high-k material Zirconium Oxide (ZrO2) deposition.
Metal OxidesChinaEuropeJapanKoreaTaiwanLogicSemiconductors