显示 1 - 10 条结果，共 232 条结果。
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Phosphine in Hydrogen Mixture
We offer Phosphine (PH3) in Hydrogen mixtures.
Phosphorus DopantsChinaEuropeJapanKoreaTaiwanDisplayElectronicSemiconductorsPhosphorus -
Spinfil® 800
Inorganic Spin-on Dielectric material designed for leading edge devices. Advanced grade in Spinfil® series.
DielectricsChinaEuropeJapanKoreaTaiwanLogicSemiconductorsSpinfil® -
PDMAT
Pentakis(dimethylamino) tantalum, PDMAT is a soild tantalum precursor for TaN barrier layers to prevent copper diffusion in semiconductor application.
Deposition - Metal HardmaskMetal HardmasksMetal NitridesMetalsChinaEuropeJapanKoreaTaiwanLogicSemiconductorsTantalum -
HCI – VLSI2 Hydrogen Chloride
Hydrogen Chloride (HCl) is used in various surface cleaning processes and to clean LPCVD chambers.
Cleaning GasesEtchingChinaEuropeJapanKoreaTaiwanLogic -
Copper Bulk CMP slurries: Cu Low dishing CMP, Cu High Rate CMP
Our Copper Bulk CMP products are tunable Slurries designed to meet performance requirements for removal rate, topography and defectivity.
Advanced PackagingBEOL InterconnectChinaEuropeJapanKoreaTaiwanLogicSensors (MEMS, Optoelectronics)COPPEREADY®Copper -
TDMAT
TDMAT is a liquid chemical source suitable for the chemical vapor deposition of titanium nitride films. TiN films are effective diffusion barriers for IC applications.
Deposition - Metal HardmaskHardmasksMetal HardmasksMetal NitridesChinaEuropeJapanKoreaTaiwanDisplayLogicSemiconductors -
Dynalube™ Equipment Storage Fluid
Dynalube™ Equipment Storage Fluid is a companion product to our urethane cleaning solvents. Dynalube™ Equipment Storage Fluid is used in urethane processing equipment that is stored for an extended period.
Polymer Removal ChemistriesChinaEuropeJapanKoreaTaiwanSpray Foam InsulationDynalube -
TiCL4 ─ Titanium Tetrachloride
Titanium Tetrachloride (TiCl4) is a liquid source material for the chemical vapor Thin Film Deposition (CVD) of titanium nitride, titanium dioxide and titanium metal.
Metal NitridesChinaEuropeJapanKoreaTaiwanLogicSemiconductors -
HtB-Octane
Hafnium Tetiary Butoxide-Octane(HtB-Octane) is a liquid source material for HfO2 gate dielectric.
High-kMetal OxidesChinaEuropeJapanKoreaTaiwanLogicSemiconductors -
DYNASTRIP® AP7880T Multipurpose Photoresist Remover
DYNASTRIP® AP7880T Multipurpose Photoresist Remover is a uniquely formulated photoresist remover designed specifically for stripping thick resist (dry film or liquid) used in wafer level (WLP).
Litho CleansChinaEuropeJapanKoreaTaiwanDynastrip®