显示 161 - 170 条结果，共 232 条结果。
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NO ─ Nitric Oxide
Nitric Oxide (NO) is toxic gas which easily decomposes into N2O and NO2. Main usage in IC is nitride annealing.
DepositionChinaEuropeJapanKoreaTaiwanSemiconductorsNitrogenOxygen -
SiCl4 ─ Silicon Tetrachloride
SiCl4 is used as an intermediate in the manufacture of polysilicon, a hyper pure form of silicon since it has a boiling point convenient for purification by repeated fractional distillation.
Metal HardmasksChinaEuropeJapanKoreaTaiwanSemiconductorsChlorineSilicon -
BPS-100
BPS-100 aluminum oxide remover is a fluoride containing chemistry specially formulated for removal of organic and highly chemistry specially formulated for removal of organic.
Litho CleansChinaEuropeJapanKoreaTaiwanSemiconductors -
Dynasolve® CU-5 Cured Urethane Cleaning Solvent
Dynasolve® CU-5 is a formulated cleaning solvent used to remove cured urethane materials. It is used primarily in spray polyurethane foam and industrial cleaning applications.
Polymer Removal ChemistriesChinaJapanKoreaTaiwanIndustrialDynasolve® -
SiH2Cl2 ─ Dichlorosilane
SiH2Cl2(DCS); Disilane which is more expensive in Silicon Epi applications and in advanced logics. Other applications include some spacer applications and some Dieletrics.
Metal HardmasksEuropeSemiconductorsChlorineHydrogenSilicon -
ACT® 927C
ACT® 927C etch residue remover is a highly effective hydroxylamine (HA) product for aluminum clean applications.
AI IC CleansChinaEuropeJapanKoreaTaiwanSemiconductorsACT® -
WCl5
WCl5 is used for CVD or ALD fluorine-free Tungsten liner and fill depositions for metal gate contact in logic devices.
High-kMetal OxidesChinaEuropeJapanKoreaTaiwanLogicSemiconductors -
Flipstrip™ Multipurpose Photoresist Remover
Flipstrip™ Multipurpose Photoresist Remover is a uniquely formulated chemistry designed specifically for the removal of processed photoresists used in flip-chip bumping applications.
Litho CleansChinaEuropeJapanKoreaTaiwanFlipstrip™ -
HCl ─ Hydrogen Chloride MEGA
Hydrogen Chloride (HCl) is used in various surface cleaning processes and to clean LPCVD chambers.
Cleaning GasesEtchingChinaEuropeJapanKoreaTaiwanLogic -
DSA
Directed Self-assembly (DSA) is a complimentary patterning technique that improves the CD variance of an existing pattern.
DSAChinaEuropeJapanKoreaTaiwanSemiconductors