显示 181 - 190 条结果，共 232 条结果。
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ACT® 970
ACT® 970 etch residue remover and positive photoresist stripper is an extremely effective amine based product for aluminum and copper applications.
AI IC CleansChinaEuropeJapanKoreaTaiwanSemiconductorsACT® -
Cl2 – Chlorine MEGA
Chlorine (Cl2) MEGA is a toxic, corrosive, greenish-yellow gas that is irritating to the eyes and the respiratory system. This product is sold in Europe & USA.
Cleaning GasesEtchingEuropeSemiconductorsChlorine -
CHEMGUARD® GenIII Controller Retrofit
CHEMGUARD® GenIII Controller Retrofit. Upgrade to the CHEMGUARD® Gen III Controller for enhanced reliability, configurability and extend the life of your capital investment.
Chemical Delivery SystemsChinaEuropeJapanKoreaTaiwanDisplayElectronicEquipmentIndustrialLogicSensors (MEMS, Optoelectronics)BoronCopperGalliumHafniumTantalumTitaniumTungsten -
ACT® 690S
ACT® 690S etch residue remover and positive photoresist stripper is a solvent based product for stripping severely processed photoresist films and etch residues.
AI IC CleansChinaEuropeJapanKoreaTaiwanSemiconductorsACT® -
Dynasolve® 100 Cured Urethane and Acrylic Cleaning Solvent
Dynasolve® 100 Cured Urethane and Acrylic Cleaning Solvent is a formulated solvent used for the removal of rigid urethane foams, acrylic films and acrylic-based adhesives.
Polymer Removal ChemistriesChinaEuropeJapanKoreaTaiwanIndustrialDynasolve® -
HC-100
Special rinse solvent designed for all Spinfil® product lines.
DielectricsChinaEuropeJapanKoreaTaiwanLogicSemiconductors -
Phosphine in Argon Mixture
We offer Phosphine (PH3) in Argon (Ar) mixtures.
Phosphorus DopantsChinaEuropeJapanKoreaTaiwanSemiconductorsPhosphorus -
SiH2Cl2 ─ Dichlorosilane (Asia only)
SiH2Cl2(DCS); Disilane which is more expensive in Silicon Epi applications and in advanced logics. Other applications include some spacer applications and some Dieletrics. This grade is sold in asia only.
Metal HardmasksChinaJapanKoreaTaiwanSemiconductorsChlorineHydrogenSilicon -
GasSTAR – BSGS
The GasSTAR Bulk Specialty Gases System delivers maximum safety and reliability (99% uptime), lower cost-of-ownership, compatibility with many gases and flexible sources & flow-rate scalability up to 1000 slpm.
Delivery Systems & ServicesChinaTaiwanSemiconductors -
ACT® NE-111
ACT® NE-111 etch residue remover is a buffered, pH stable fluoride containing stripper specifically formulated for removal of highly oxidized etch residues while reducing surface metal contamination.
AI IC CleansChinaEuropeJapanKoreaTaiwanSemiconductorsACT®