显示 141 - 150 条结果，共 232 条结果。
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BPS-169
BPS-169 positive photoresist remover is an organic solvent blend which is particularly effective in removing severely processed photoresist films and etch residue over corrosion sensitive metals and alloys.
Litho CleansChinaEuropeJapanKoreaTaiwanSemiconductors -
BCl3 ─ Boron Trichloride
Boron Trichloride (BCl3) is a low vapor pressure gas. This molecule is used in a broad range of applications such as drying etching gases for aluminum wiring used in semiconductor and LCD manufacturing.
EtchingChinaEuropeJapanKoreaTaiwanDisplayLogicSemiconductorsCarbon -
GasSTAR – VMB/P
GasSTAR UHP rack mounted valve manifold boxes (VMB), valve manifold panels (VMP) are used for the safe distribution of hazardous and inert gases in submicron semiconductor applications.
Delivery Systems & ServicesChinaTaiwanSemiconductors -
SoC
Spin-on carbon materials provide high transparency for improved overlay control, high throughput compared to CVD alternatives, and high thermal stability for compatibility in various integration flows.
Spin-on Carbon (SOC)ChinaEuropeJapanKoreaTaiwanSemiconductorsAZ® -
S-1088 Exhausted Line Rinse Station
Our Model S-1088 Exhausted Line Rinse Station is a self-contained, fully automatic system designed to clean stainless steel exhaust lines, and other FAB parts with a user programmable DIW and acid blend.
Parts and Carrier CleansChinaEuropeJapanKoreaTaiwanElectronicEquipmentIndustrialLogicSensors (MEMS, Optoelectronics) -
Tungsten CMP slurries
Our Tungsten CMP products are tunable Slurries designed to meet performance requirements for removal rate, topography and defectivity.
MOL MG & ContactsChinaEuropeJapanKoreaTaiwanLogicSensors (MEMS, Optoelectronics)Tungsten -
C2F6 ─ Hexafluoroethane Halocarbon 116
Hexafluoroethane Halocarbon 116 (C2F6) is our highest purity offering for semiconductor and MEMS etching applications and MEMS chamber cleaning applications.
Cleaning GasesEtchingChinaEuropeJapanKoreaTaiwanSemiconductorsCarbonNitrogenOxygen -
Dynasolve® CU-6 Urethane Cleaning Solvent
Dynasolve® CU-6 is a formulated cleaning solvent used to flush cured/uncured urethane materials and crystalized isocyanate. It is used primarily in spray polyurethane foam and industrial cleaning applications.
Polymer Removal ChemistriesChinaJapanKoreaTaiwanSpray Foam InsulationDynasolve® -
ION-X® PH3 ─ Phosphine ION-X® Dopant Gas Storage and Delivery System
Phosphine (PH3) ION-X® dopant gas storage and delivery system available for our worldwide customers.
Phosphorus DopantsChinaEuropeJapanKoreaTaiwanSemiconductorsION-X®Phosphorus -
Octane
Octane is a liquid source material for a solvent.
DepositionChinaEuropeJapanKoreaTaiwanLogicSemiconductors