显示 41 - 50 条结果，共 232 条结果。
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Dynasolve® CU-9 Cured Urethane Cleaning Solvent
Dynasolve® CU-9 Cured Urethane Cleaning Solvent is a formulated solvent used to remove the buildup of silicone release agent and cured urethane from urethane molds and tools.
Polymer Removal ChemistriesChinaJapanKoreaTaiwanIndustrialDynasolve® -
FLOWMASTER® CMP Chemical Delivery System
The FLOWMASTER® CMP Chemical Delivery System supplies precise blending and delivery of post-CMP rinse chemical.
CMP Slurry Delivery SystemsChinaEuropeJapanKoreaTaiwanEquipmentLogicSensors (MEMS, Optoelectronics)FLOWMASTER -
Copper Barrier CMP slurries: BAR Tunable barrier CMP
Our Copper Barrier CMP products are tunable Slurries designed to meet performance requirements for removal rate with Copper, Liners and dielectric e.g. Low K rate tunability.
Advanced PackagingBEOL InterconnectChinaEuropeJapanKoreaTaiwanLogicSensors (MEMS, Optoelectronics)DA Nano® -
ACT® XT-1100
ACT® XT-1100 etch residue remover and positive photoresist stripper is a fluoride containing chemistry formulated for removal of organic and highly oxidized etch residues.
Litho CleansChinaEuropeJapanKoreaTaiwanSemiconductorsACT® -
Trans-LC
Trans-LC® (Trans 1,2-Dichloroethylene) is an ozone-safe liquid chlorine source for use in silicon oxidation and tube cleaning.
DepositionSurface Prep & Cleaning (SP&C)ChinaEuropeJapanKoreaTaiwanLogicSemiconductors -
PUR-FLUSH 100, 200, and 300 Uncured Urethane Flushing Solvents
PUR-FLUSH 100, 200, and 300 Uncured Urethane Flushing Solvents are formulated solvents that were developed for use in flushing uncured urethane from various types of polyurethane processing equipment.
Polymer Removal ChemistriesChinaJapanKoreaTaiwanIndustrial -
C4F6 ─ Hexafluorobutadiene nCtrl
Hexafluoro-1,3-butadiene (Hexafluorobutadine C4F6) is used for dielectric etch applications. Hexafluoro-1,3-butadiene is a toxic, colorless, odorless, flammable liquefied compressed gas.
EtchingChinaEuropeJapanKoreaTaiwanLogicArgonCarbonFluorineNitrogenOxygen -
CF4 ─ Carbon Tetrafluoride VLSI
Carbon Tetrafluoride VLSI (CF4) is used for chamber cleaning in semiconductor applications, in MEMS etching applications, and in Flat Panel Display etching applications.
DopingEtchingChinaEuropeJapanKoreaTaiwanDisplayLogicSensors (MEMS, Optoelectronics)CarbonFluorine -
DEZn
Diethylzinc (DEZn) has been demonstrated to be useful as a II-VI source material and also as a p-type dopant of III-V alloys.
DepositionDopingMetalsOther DopantsChinaEuropeJapanKoreaTaiwanLogicSemiconductors -
PH3 ─ Phosphine MOCVD
We offer Phosphine (PH3) in two grades for use in semiconductor and photovoltaic process applications: MOCVD Phosphine (99.9998%) and Megabit® II Phosphine (99.9999%).
Phosphorus DopantsChinaEuropeJapanKoreaTaiwanSemiconductorsPhosphorus