显示 1 - 10 条结果，共 22 条结果。
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HCI – VLSI2 Hydrogen Chloride
Hydrogen Chloride (HCl) is used in various surface cleaning processes and to clean LPCVD chambers.
Cleaning GasesEtchingChinaEuropeJapanKoreaTaiwanLogic -
NF3 ─ Nitrogen Trifluoride VLSI
Nitrogen Trifluoride (NF3) is used in silicon semiconductor process applications.
Cleaning GasesEtchingChinaEuropeJapanKoreaTaiwanSemiconductorsFluorineNitrogen -
eF2/N2 (Electronic Grade) 20% Fluorine
We have a long history as the world's leading provider of AIROPAK® fluorine gas mixtures for surface modification of plastics and fluoropolymers.
DielectricsEdge Bead Remover (EBR)EtchingSpacer PatterningChinaEuropeJapanKoreaTaiwanElectronicIndustrialLogicSensors (MEMS, Optoelectronics)FluorineNitrogen -
eF2/N2 (Electronic Grade) 10% Fluorine
We have a long history as the world's leading provider of AIROPAK® fluorine gas mixtures for surface modification of plastics and fluoropolymers.
DielectricsEdge Bead Remover (EBR)EtchingSpacer PatterningChinaEuropeJapanKoreaTaiwanElectronicIndustrialLogicSensors (MEMS, Optoelectronics)FluorineNitrogen -
C4F6 ─ Hexafluorobutadiene nCtrl
Hexafluoro-1,3-butadiene (Hexafluorobutadine C4F6) is used for dielectric etch applications. Hexafluoro-1,3-butadiene is a toxic, colorless, odorless, flammable liquefied compressed gas.
EtchingChinaEuropeJapanKoreaTaiwanLogicArgonCarbonFluorineNitrogenOxygen -
CF4 ─ Carbon Tetrafluoride VLSI
Carbon Tetrafluoride VLSI (CF4) is used for chamber cleaning in semiconductor applications, in MEMS etching applications, and in Flat Panel Display etching applications.
DopingEtchingChinaEuropeJapanKoreaTaiwanDisplayLogicSensors (MEMS, Optoelectronics)CarbonFluorine -
C4F6 ─ Hexafluorobutadiene VLSI
Hexafluorobutadine (Hexafluoro-1,3-butadiene) C4F6 is used for dielectric etch applications. Hexafluoro-1,3-butadiene is a toxic, colorless, odorless, flammable liquefied compressed gas.
EtchingChinaEuropeJapanKoreaTaiwanLogicArgonCarbonFluorineNitrogenOxygen -
C4F8 ─ Octafluorocyclobutane VLSI
Octofluorocyclobutane VLSI (C4F8) (99.999%) is a colorless, odorless, non-flammable liquefied, high purity gas used in semiconductor applications. VLSI Grade (99.999%) is our highest purity grade.
EtchingChinaEuropeJapanKoreaTaiwanSemiconductorsFluorineNitrogenOxygen -
20% F2/N2 Mixture ─ AIROPAK® F2/N2 20% Fluorine in Nitrogen Mixture – Commercial Grade
We have a long history as the world's leading provider of AIROPAK® fluorine gas mixtures for surface modification of plastics and fluoropolymers.
DielectricsEdge Bead Remover (EBR)EtchingSpacer PatterningChinaEuropeJapanKoreaTaiwanElectronicIndustrialLogicSensors (MEMS, Optoelectronics)FluorineNitrogen -
SF6 ─ Sulfur Hexafluoride
Sulfur Hexafluoride (SF6) is offered in a high purity grade for semiconductor and TFT-LCD process applications.
EtchingChinaEuropeJapanKoreaTaiwanSemiconductorsNitrogenOxygen