显示 211 - 220 条结果，共 233 条结果。
-
ACT® 690SX
ACT® 690SX is an organic solvent-based blend that is very effective in removing severely processed photoresist films and etch residue over corrosive sensitive metals and alloys.
AI IC CleansChinaEuropeJapanKoreaTaiwanSemiconductorsACT® -
CBr4 ─ Carbon tetrabromide
Carbon tetrabromide (CBr4) is mainly used as a Carbon source for the p-type doping of various III-V alloys.
DopingMetalsOther DopantsChinaEuropeJapanKoreaTaiwanLogicSemiconductors -
XeF2 ─ Xenon Difluoride
Xenon Difluoride (XeF2) is a highly selective isotropic etching gas used in the MEMs market. We offer a stable, low-cost supply of XeF2.
DepositionEtchingChinaEuropeJapanKoreaTaiwanLogicSemiconductors -
Kr ─ Krypton
Krypton (Kr) is a colorless, odorless, tasteless noble gas that occurs in trace amounts in the atmosphere. With rare exceptions, Krypton is chemically inert.
EtchingChinaEuropeJapanKoreaTaiwan3D NANDIndustrialKrypton -
Xe ─ Xenon
Xenon (Xe) is a colorless, noble and compressed gas with no odor warning properties.
EtchingChinaEuropeJapanKoreaTaiwan3D NANDIndustrialXenon -
Dynasolve® CU-7 Cured Polyimide Cleaning Solvent
Dynasolve® CU-7 Cured Polyimide Cleaning Solvent is a formulated solvent used to remove cured polyimide materials.
Polymer Removal ChemistriesChinaJapanKoreaTaiwanElectronicIndustrialDynasolve® -
TARC
TARC is a cost-effective solution for reflectivity control in applications from i-line, KrF and ArF lithography and improves on resist performance by providing a capping layer to prevent contaminations.
TARCChinaEuropeJapanKoreaTaiwanSemiconductorsAZ® -
Thick film resists
TFR enables manufacturing of patterned conductive circuitry (TSV, RDL and bumping) and is used for various applications: Fine pitch, high resolution, good chemical resistance, tunable profile including vertical
Thick-film ResistsChinaEuropeJapanKoreaTaiwanSemiconductorsAZ® -
10% F2/N2 Mixture ─ AIROPAK® F2/N2 10% Fluorine in Nitrogen Mixture – Commercial Grade
We have a long history as the world's leading provider of AIROPAK® fluorine gas mixtures for surface modification of plastics and fluoropolymers.
DielectricsEdge Bead Remover (EBR)EtchingSpacer PatterningChinaEuropeJapanKoreaTaiwanElectronicIndustrialLogicSensors (MEMS, Optoelectronics)FluorineNitrogen -
KrF Thick film resists
KrF thick film resists perform high sensitivity and high resolution with excellent pattern profile. Good etch resistance and ion implantation tolerance enable several applications for IC device manufacturers.
KrF Thick-film ResistsChinaEuropeJapanKoreaTaiwanSemiconductorsAZ®