显示 221 - 230 条结果，共 232 条结果。
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Cl2 ─ Chlorine VLSI
Chlorine VLSI (Cl2) is a toxic, corrosive, greenish-yellow gas that is irritating to the eyes and the respiratory system. This product is sold in Europe & USA.
Cleaning GasesEtchingEuropeSemiconductorsChlorine -
Emergency Response Containment Vessel Model 5502
The Emergency Response Containment Vessel ECRV Model 5502 vessel can safely contain the gas from a 50 liter cylinder filled to 150 bar.
Emergency EquipmentFab ServicesChinaEuropeJapanKoreaTaiwanConductive AdhesivesDisplayElectronicEquipmentIndustrialLogicSensors (MEMS, Optoelectronics)Spray Foam Insulation -
SiHCl3 ─ Trichlorosilane
Used mostly for silicon epi applications in semi fab and semi wafer production. Used with HCl for depositing Epitaxial film on wafers.
DepositionChinaEuropeJapanKoreaTaiwanSemiconductorsChlorineHydrogenSilicon -
QMAC® Quality Monitoring and Control Analytical System
Our QMAC® Quality Monitoring and Control Analytical System is a proven solution to enable successful semiconductor manufacturing by monitoring bulk and specialty gases impurities.
Equipment MonitoringChinaEuropeJapanKoreaTaiwanConductive AdhesivesDisplayElectronicEquipmentIndustrialLogicSensors (MEMS, Optoelectronics)Spray Foam Insulation -
Dynasolve® Pi4310 Polyimide Remover
Dynasolve® Pi4310 Polyimide Remover is a uniquely formulated chemistry designed specifically for the removal of polyimide in various process stages requiring rework in wafer level packaging (WLP) applications.
Litho CleansChinaEuropeJapanKoreaTaiwanDynasolve® -
Diethoxymethylsilane
Diethoxymethylsilane (DEMS®) Precursor is used as a silicon source for the chemical vapor deposition of high quality low constant films and silicon dioxide films.
ChinaEuropeJapanKoreaTaiwanLogicSemiconductors -
TMB
Trimethylborate (TMB) is used as a liquid boron dopant in the Thin Film Deposition of Borosilicate (BSG) and Borophosphosilicate (BPSG) glasses to reduce the reflow temperatures of the deposited glass.
Boron DopantsDepositionDopingMetalsChinaEuropeJapanKoreaTaiwanLogicSemiconductors -
Poly-Flush® Stereolithography (SLA) 3D Printing Cleaning Solvent
Poly-Flush® Stereolithography (SLA) 3D Printing Cleaning Solvent is a formulated solvent used to clean uncured resin from SLA 3D printed parts.
Polymer Removal ChemistriesChinaJapanKoreaTaiwanIndustrial -
ACT® 915A
ACT® 915A etch residue remover is a highly effective hydroxylamine (HA) based product for aluminum clean applications. It is well adopted in the worldwide semiconductor industry.
AI IC CleansChinaEuropeJapanKoreaTaiwanSemiconductorsACT® -
CHEMGUARD® GENIII CG050 High Flow Bubbler
CHEMGUARD® CG050 High Flow Bubbler is an automated high flow bubbler designed to support EPI manufacturing with for maximum uptime and to meet the demanding needs of todays manufacturing fabs.
Chemical Delivery SystemsChinaEuropeJapanKoreaTaiwanDisplayElectronicEquipmentIndustrialLogicSensors (MEMS, Optoelectronics)BoronCopperGalliumHafniumTantalumTitaniumTungsten