显示 201 - 210 条结果，共 232 条结果。
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Rinse 500
Well designed EBR solvent to enable good EBR shape (lower hump height).
DielectricsChinaEuropeJapanKoreaTaiwanLogicSemiconductors -
C5F8 ─ Octafluorocyclopentene
Octofluorocyclopentene C5F8 (99.99%) VLSI Grade is our highest purity grade for semiconductor applications.
EtchingChinaEuropeKoreaTaiwanSemiconductorsNitrogenOxygen -
ION-X® BF3 ─ Boron Trifluoride ION-X® Dopant Gas Storage and Delivery System
Isotopically Enriched BF3 (Boron Trifluoride) ION-X® Dopant Gas Storage and Delivery System sub atmospheric dopant gas storage and delivery system solutions for our worldwide customers.
Boron DopantsSub-Atmospheric Gas Storage and DeliveryChinaEuropeJapanKoreaTaiwanSemiconductorsION-X®Boron -
Dynasolve® Final Prep Precision Cleaning Solvent
Dynasolve® Final Prep is a fast evaporating formulated cleaning solvent for critical cleaning applications as well as final rinsing applications.
Polymer Removal ChemistriesChinaEuropeJapanKoreaTaiwanIndustrialDynasolve® -
Shrink
Chemical shrink is a post-resist-patterning process that can shrink trench or contact hole patterns. Shrinkage is process controlled during standard bake temperatures.
ShrinkChinaEuropeJapanKoreaTaiwanSemiconductorsAZ® -
BPS-729A
BPS-729A is a surfactant formulated low resistivity dicing solution.
Litho CleansChinaEuropeJapanKoreaTaiwanSemiconductors -
ArF Rinse
Industry standard brought through our collaboration with TEL. Improvements have been observed in resist pattern collapse, process window, and resolution by replacing DI water with ArF rinse.
ArF RinseChinaEuropeJapanKoreaTaiwanSemiconductorsAZ® -
ACT® 114
ACT® low hydroxylamine (HA) etch residue remover is formulated for aluminum BEOL cleaning.
AI IC CleansChinaEuropeJapanKoreaTaiwanSemiconductorsACT® -
RS series
Low temperature Silicon base spin-on dielectric material.
DielectricsHardmasksLow-k DielectricsChinaEuropeJapanKoreaTaiwanLogicSemiconductors -
ACT® 690SX
ACT® 690SX is an organic solvent-based blend that is very effective in removing severely processed photoresist films and etch residue over corrosive sensitive metals and alloys.
AI IC CleansChinaEuropeJapanKoreaTaiwanSemiconductorsACT®