显示 1 - 10 条结果，共 16 条结果。

1. PDMAT

   Pentakis(dimethylamino) tantalum, PDMAT is a soild tantalum precursor for TaN barrier layers to prevent copper diffusion in semiconductor application.

   Deposition - Metal Hardmask

   Metal Hardmasks

   Metal Nitrides

   Metals

   China

   Europe

   Japan

   Korea

   Taiwan

   Logic

   Semiconductors

   Tantalum
2. WF6 ─ Tungsten Hexafluoride Megaclass

   Tungsten Hexafluoride (WF6), Megaclass grade (99.9995%), is our highest purity grade for silicon semiconductor metallization process applications, offering full metals analysis.

   Deposition

   Metals

   China

   Europe

   Japan

   Korea

   Taiwan

   Logic

   Tungsten
3. DMZn

   Dimethylzinc (DMZn) has been demonstrated to be useful as a II-VI source material and also as a p-type dopant of III-V alloys.

   Deposition

   Doping

   Metals

   Other Dopants

   China

   Europe

   Japan

   Korea

   Taiwan

   Logic

   Semiconductors
4. DEZn

   Diethylzinc (DEZn) has been demonstrated to be useful as a II-VI source material and also as a p-type dopant of III-V alloys.

   Deposition

   Doping

   Metals

   Other Dopants

   China

   Europe

   Japan

   Korea

   Taiwan

   Logic

   Semiconductors
5. TMG

   Trimethylgallium (TMGa) is the most widely used source for GaAs MOVPE.

   Metals

   Other Dopants

   China

   Europe

   Japan

   Korea

   Taiwan

   Logic

   Semiconductors
6. TEG

   Triethylgallium (TEGa) is the used for GaAs MOVPE, due to its lower V.P. than TMG, is less suitable for atmospheric but rather low pressure MOVPE applications.

   Metals

   Other Dopants

   China

   Europe

   Japan

   Korea

   Taiwan

   Logic

   Semiconductors
7. TEB

   Triethylborate (TEB) is a liquid boron source used for Borosilicate (BSG) and Borophosphosilicate (BPSG) glass Thin Film Deposition in low pressure, atmospheric pressure and plasma enhanced CVD systems.

   Boron Dopants

   Deposition

   Doping

   Metals

   China

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   Taiwan

   Logic

   Semiconductors
8. MoO2Cl2 ─ Molybdenum Dichloride Dioxide

   Molybdenum Dichloride Dioxide(MoO2Cl2) is a solid source material and it is for fluorine free metal application for logic, DRAM and 3DNAND devices.

   Metals

   China

   Europe

   Japan

   Korea

   Taiwan

   Logic

   Semiconductors
9. CPMG

   Bis(cyclopentadienyl) magnesium, CpMG is a soild MO source for p-type dopant in compound semconductor applications.

   Metals

   China

   Europe

   Japan

   Korea

   Taiwan

   Logic

   Semiconductors
10. CCTBA

    μ2-(η2-tert-butylacetylene) dicobalthexacarbonyl, CCTBA is a liquid cobalt precursor for seed layer and gate fill in semiconductor application.

    Metals

    China

    Europe

    Japan

    Korea

    Taiwan

    Logic

    Semiconductors