显示 171 - 180 条结果，共 232 条结果。
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FX-30 FOUP FOSB Cleaner
Our FX-30 FOUP FOSB Cleaner is specifically engineered for 300mm FOUPs (Front Opening Unified Pods) and FOSBs (Front Opening Supply Boxes).
Parts and Carrier CleansChinaEuropeJapanKoreaTaiwanElectronicEquipmentLogicSensors (MEMS, Optoelectronics) -
Triethylborate
Triethylborate (TEB) is a liquid boron source used for Borosilicate (BSG) and Borophosphosilicate (BPSG) glass Thin Film Deposition in low pressure, atmospheric pressure and plasma enhanced CVD systems.
DepositionDopingChinaEuropeJapanKoreaTaiwanSemiconductors -
ACT® 940
ACT® 940 etch residue remover and positive photoresist is a highly effective hydroxylamine (HA) based product for aluminum clean applications.
AI IC CleansChinaEuropeJapanKoreaTaiwanSemiconductorsACT® -
ACT® EZStrip® 528H
ACT® EZStrip® 528H post etch residue remover is fluoride containing product specially formulated for effective removal of post etch and ash residue.
AI IC CleansChinaEuropeJapanKoreaTaiwanSemiconductorsACT® -
ACT® 930
ACT® 930 etch residue remover and positive photoresist is a low hydroxylamine (HA) based product for aluminum applications.
AI IC CleansChinaEuropeJapanKoreaTaiwanSemiconductorsACT® -
NH3 ─ Ammonia VLSI
Ammonia (NH3) VLSI is a high-purity grade for opto-electronic, RF and Power applications.
Emerging DopantsChinaEuropeJapanKoreaTaiwanLogicSemiconductorsCarbon -
WF6 ─ Tungsten Hexafluoride Semiconductor
Tungsten Hexafluoride (WF6), Semiconductor grade (99.9%), is a toxic, corrosive, odorless, liquefied gas.
DepositionMetalsChinaEuropeJapanKoreaTaiwanLogicTungsten -
Dynasolve® Mold Cleaner 1000 Urethane Mold Cleaning Solvent
Dynasolve® Mold Cleaner 1000 Urethane Mold Cleaning Solvent is a formulated cleaning solvent that is used in the urethane molding industry.
Polymer Removal ChemistriesChinaJapanKoreaTaiwanIndustrialDynasolve® -
DYNASTRIP® DL9150B TMAH-Free Multipurpose Photoresist and Post-Etch Residue Remover
DYNASTRIP® DL9150B Tetramethylammonium Hydroxide (TMAH)-Free Multipurpose Photoresist and Post-Etch Residue Remover.
Litho CleansChinaEuropeJapanKoreaTaiwanDynastrip® -
H2Se ─ Hydrogen Selenide UHP
Hydrogen Selenide (H2Se) UHP Grade is our high purity offering for electronic applications, specifically CIGS (Copper, Indium Gallium Selenium) process applications.
DepositionChinaEuropeJapanKoreaTaiwanElectronicSemiconductors