显示 101 - 110 条结果，共 232 条结果。
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C2H2 ─ Acetylene Megaclass
Acetylene (C2H2) is a flammable gas dissolved into solvent for delivery. Main usage in the IC industry is as a carbon source for Amorphous Carbon Layer or Hardmask.
ChinaEuropeJapanKoreaTaiwanDisplayElectronicIndustrialLogicCarbon -
BTBAS
BTBAS Bis(tertiary-butylamino)silane EXTREMA® is a precursor for depositing silicon nitride and silicon oxide films at lower temperatures.
DepositionDielectricsSpacer PatterningChinaEuropeJapanKoreaTaiwanLogicSemiconductorsSensors (MEMS, Optoelectronics) -
HfCl4 ─ Hafnium tetrachloride
Hafnium tetrachloride (HfCl4) is a solid source material for the atomic layer Thin Film Deposition (ALD) of hafnium oxide films.
High-kMetal OxidesChinaEuropeJapanKoreaTaiwanLogicSemiconductors -
HFAC
Hexafluoroacetylacetone(HFRC) is a liquid source material for dry etch Cu and cleaning metals.
DepositionChinaEuropeJapanKoreaTaiwanLogicSemiconductors -
Alpha-Terpinene
Alpha-terpinene (ATRP) Precursor is used as a sacrificial organic precursor for the chemical vapor deposition of high quality low constant films.
ChinaEuropeJapanKoreaTaiwanLogicSemiconductors -
GeH4 ─ Germane
Germane (GeH4) is a gas used for depositing the SiGe layer, which provides improved electric properties.
DepositionChinaEuropeJapanKoreaTaiwanLogic -
C4F8 ─ Octafluorocyclobutane VLSI
Octofluorocyclobutane VLSI (C4F8) (99.999%) is a colorless, odorless, non-flammable liquefied, high purity gas used in semiconductor applications. VLSI Grade (99.999%) is our highest purity grade.
EtchingChinaEuropeJapanKoreaTaiwanSemiconductorsFluorineNitrogenOxygen -
ACT® 273
ACT® 273 etch residue remover is a semi aqueous product designed for CoWP/Cu and porous low k technologies.
AI IC CleansChinaEuropeJapanKoreaTaiwanSemiconductorsACT® -
20% F2/N2 Mixture ─ AIROPAK® F2/N2 20% Fluorine in Nitrogen Mixture – Commercial Grade
We have a long history as the world's leading provider of AIROPAK® fluorine gas mixtures for surface modification of plastics and fluoropolymers.
DielectricsEdge Bead Remover (EBR)EtchingSpacer PatterningChinaEuropeJapanKoreaTaiwanElectronicIndustrialLogicSensors (MEMS, Optoelectronics)FluorineNitrogen -
TaCl5
TaCl5 is a solid ALD precursor for deposition of Tantalum Nitride films.
Metal NitridesChinaEuropeJapanKoreaTaiwanLogicSemiconductors