产品目录

本目录包含我们的半导体解决方案产品组合，包括半导体材料和交付系统与服务。有关详细信息，请查看每个产品页面上的数据表或联系我们当地的客户服务代表。还要注意，这是我们的全球产品组合。请筛选您的位置以查看所在国家/地区的可用产品。

  1. 4MS

    Tetramethylsilane (4MS) is a precursor for depositing carbon doped silicon films and silicon carbide-like films.

    Dielectrics
    China
    Europe
    Japan
    Korea
    Taiwan
    Logic
    Semiconductors
  2. eF2/N2 (Electronic Grade) 20% Fluorine

    We have a long history as the world's leading provider of AIROPAK® fluorine gas mixtures for surface modification of plastics and fluoropolymers.

    Dielectrics
    Edge Bead Remover (EBR)
    Etching
    Spacer Patterning
    China
    Europe
    Japan
    Korea
    Taiwan
    Electronic
    Industrial
    Logic
    Sensors (MEMS, Optoelectronics)
    Fluorine
    Nitrogen
  3. eF2/N2 (Electronic Grade) 10% Fluorine

    We have a long history as the world's leading provider of AIROPAK® fluorine gas mixtures for surface modification of plastics and fluoropolymers.

    Dielectrics
    Edge Bead Remover (EBR)
    Etching
    Spacer Patterning
    China
    Europe
    Japan
    Korea
    Taiwan
    Electronic
    Industrial
    Logic
    Sensors (MEMS, Optoelectronics)
    Fluorine
    Nitrogen
  4. TEOS

    Tetraethyl Orthosilicate (TEOS) is used as a semiconductor silicon source for the Thin Film Deposition of doped and undoped silicon dioxide films.

    Dielectrics
    China
    Europe
    Japan
    Korea
    Taiwan
    Display
    Logic
    Semiconductors
  5. BTBAS

    BTBAS Bis(tertiary-butylamino)silane EXTREMA® is a precursor for depositing silicon nitride and silicon oxide films at lower temperatures.

    Deposition
    Dielectrics
    Spacer Patterning
    China
    Europe
    Japan
    Korea
    Taiwan
    Logic
    Semiconductors
    Sensors (MEMS, Optoelectronics)
  6. 20% F2/N2 Mixture ─ AIROPAK® F2/N2 20% Fluorine in Nitrogen Mixture – Commercial Grade

    We have a long history as the world's leading provider of AIROPAK® fluorine gas mixtures for surface modification of plastics and fluoropolymers.

    Dielectrics
    Edge Bead Remover (EBR)
    Etching
    Spacer Patterning
    China
    Europe
    Japan
    Korea
    Taiwan
    Electronic
    Industrial
    Logic
    Sensors (MEMS, Optoelectronics)
    Fluorine
    Nitrogen
  7. Trimethylsilane

    Semiconductor Grade Trimethylsilane (99.995%) is our standard high-purity offering for Low-k semiconductor applications. Trimethylsilane is a colorless, odorless, and highly-flammable gas.

    Dielectrics
    China
    Europe
    Japan
    Korea
    Taiwan
    Logic
    Semiconductors
  8. 10% F2/N2 Mixture ─ AIROPAK® F2/N2 10% Fluorine in Nitrogen Mixture – Commercial Grade

    We have a long history as the world's leading provider of AIROPAK® fluorine gas mixtures for surface modification of plastics and fluoropolymers.

    Dielectrics
    Edge Bead Remover (EBR)
    Etching
    Spacer Patterning
    China
    Europe
    Japan
    Korea
    Taiwan
    Electronic
    Industrial
    Logic
    Sensors (MEMS, Optoelectronics)
    Fluorine
    Nitrogen

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