显示 11 - 16 条结果,共 16 条结果。
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CupraSelect
CupraSelect® (CuTMVS) is a high purity liquid precursor for the LPCVD of conformal, low resistivity, pure copper films used in integrated circuit interconnect applications.
MetalsChinaEuropeJapanKoreaTaiwanLogicSemiconductors -
TMI
Trimethylindium (TMIn) is a versatile solid source of indium for indium based alloys such as InP, InSb,AlInSb, InGaAs, InGaP,AlInGaP,AlInP, and InGaN via MOVPE processes.
MetalsChinaEuropeJapanKoreaTaiwanLogicSemiconductors -
CpCo(CO)2
CpCo(CO)2 is a selective Co deposition precursor used for Cu capping applications.
MetalsChinaEuropeJapanKoreaTaiwanLogicSemiconductors -
WF6 ─ Tungsten Hexafluoride Semiconductor
Tungsten Hexafluoride (WF6), Semiconductor grade (99.9%), is a toxic, corrosive, odorless, liquefied gas.
DepositionMetalsChinaEuropeJapanKoreaTaiwanLogicTungsten -
CBr4 ─ Carbon tetrabromide
Carbon tetrabromide (CBr4) is mainly used as a Carbon source for the p-type doping of various III-V alloys.
DopingMetalsOther DopantsChinaEuropeJapanKoreaTaiwanLogicSemiconductors -
TMB
Trimethylborate (TMB) is used as a liquid boron dopant in the Thin Film Deposition of Borosilicate (BSG) and Borophosphosilicate (BPSG) glasses to reduce the reflow temperatures of the deposited glass.
Boron DopantsDepositionDopingMetalsChinaEuropeJapanKoreaTaiwanLogicSemiconductors