Advanced Oxide CMP slurries: STI Selective Oxide CMP, HPD Selective Oxide CMP

Our Advanced Oxide CMP products are Highly Selective Oxide Slurry family with Stop-on-Film capability. Designed by using ceria abrasive and chemical additive formulation technology, these products have  proven HVM quality consistency and strong global supply position. Main applications consists of interlayer dielectric/ILD and shallow trench isolation/STI for both P1 and P2 steps. Key performance differentiations include high removal rate, best-In-class topography and tunable dilution at point of use, all optimized for cost of ownership advantage.