Triethylborate (TEB) is a liquid boron source used for Borosilicate (BSG) and Borophosphosilicate (BPSG) glass Thin Film Deposition in low pressure, atmospheric pressure and plasma enhanced CVD systems.
Category:
- Boron Dopants
- Deposition
- Doping
- Metals
Locations:
- China
- Europe
- Japan
- Korea
- Taiwan
Industry:
- Logic
- Semiconductors