BTBAS Bis(tertiary-butylamino)silane EXTREMA® is a precursor for depositing silicon nitride and silicon oxide films at lower temperatures.
Category:
- Deposition
- Dielectrics
- Spacer Patterning
Locations:
- China
- Europe
- Japan
- Korea
- Taiwan
Industry:
- Logic
- Semiconductors
- Sensors (MEMS, Optoelectronics)