C2F6 ─ Hexafluoroethane Halocarbon 116

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Hexafluoroethane Halocarbon 116 (C2F6) is our highest purity offering for semiconductor and MEMS etching applications and MEMS chamber cleaning applications.

Category:
  • Cleaning Gases
  • Etching
Locations:
  • China
  • Europe
  • Japan
  • Korea
  • Taiwan
Industry:
  • Semiconductors

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Product info

Description

Hexafluoroethane Halocarbon 116 (C2F6) is our highest purity offering for semiconductor and MEMS etching applications and MEMS chamber cleaning applications. Halocarbon 116 is a colorless, odorless, liquefied gas.

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