ACT® 114

打印

ACT® low hydroxylamine (HA) etch residue remover is formulated for aluminum BEOL cleaning.

Category:
  • AI IC Cleans
Locations:
  • China
  • Europe
  • Japan
  • Korea
  • Taiwan
Industry:
  • Semiconductors
Brands:
  • ACT®

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Product info

Description

ACT® low hydroxylamine (HA) etch residue remover is formulated for aluminum BEOL cleaning. This etch residue remover has the advantage of zero etch of silicon and provides a lower cost of-ownership and superior profile.

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