BARC

AZ BARC provides a comprehensive solution for reflectivity control. The materials pose low-outgassing, reduce defects and etch rates based on proprietary polymer platforms.

Category:

BARC

Locations:

US
Korea
China
Taiwan
Japan
Europe

Industry:

Semiconductors

Brands:

AZ®

DATASHEET REQUEST

BARCs

BARCs (= Bottom Antireflective Coatings) provide a comprehensive solution for reflectivity control. The materials pose low-outgassing, reduced defective and etch rates based on proprietary polymer platforms.

Target Application

Logic and memory (i-line, KrF and ArF)

Value Proposition

Eliminates standing waves in Photoresist
Solves topography related lithography problems
Reflectivity control
Vertical profile
Gapfil, Planarization

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Summary of TARC vs. BARC

Items	TARC	BARC
Coating	Fine tune necessary on PR, especially on topography	Coating on any substrate X-link bake@>180C Outgassing: Only EB52C & EB18B
Install concerns	Micro bubble	Friendly
Etch	No need	Plasma etch
Stripping	No need	O2 ashing, strong acid
PR swing reduction	1/3	1/10, no notching
Standing wave	No improvement	Elimination
Resist profiles	Acidity control for CA PR round/T-top	Film density control for CA PR footing/undercut
Side effect	Resist defect reduction

Items	Coating	Install concerns	Etch	Stripping	PR swing reduction	Standing wave	Resist profiles	Side effect
TARC	Fine tune necessary on PR, especially on topography	Micro bubble	No need	No need	1/3	No improvement	Acidity control for CA PR round/T-top	Resist defect reduction
BARC	Coating on any substrate X-link bake@>180C Outgassing: Only EB52C & EB18B	Friendly	Plasma etch	O2 ashing, strong acid	1/10, no notching	Elimination	Film density control for CA PR footing/undercut

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DATASHEET REQUEST

BARCs

3/3

Lithography and PEM Materials

1/3

BARC

2/3

Optimal BARC FT - Simulate by software

3/3

Lithography and PEM Materials

1/3

BARC

Summary of TARC vs. BARC

寻找适合的材料