TDMAT is a liquid chemical source suitable for the chemical vapor deposition of titanium nitride films. TiN films are effective diffusion barriers for IC applications.
Category:
- Deposition - Metal Hardmask
- Hardmasks
- Metal Hardmasks
- Metal Nitrides
Locations:
- China
- Europe
- Japan
- Korea
- Taiwan
Industry:
- Display
- Logic
- Semiconductors