BBr3 ─ Boron Tribromide EXTREMA®

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Boron tribromide EXTREMA® (BBr3) is a liquid boron source used for creating P-Type regions in silicon substrates, for use in semiconductor and photovoltaic process applications.

Category:
  • Doping
  • Metal Hardmasks
Locations:
  • China
  • Europe
  • Japan
  • Korea
  • Taiwan
Industry:
  • Semiconductors

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Product info

Description

Boron tribromide EXTREMA® (BBr3) is a liquid boron source used for creating P-Type regions in silicon substrates, for use in semiconductor and photovoltaic process applications. Dopant levels can be easily controlled by adjusting the deposition and diffusion processes. Typical applications include base and isolation regions in bipolar devices and source, drain and isolation regions in MOSFET devices.

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