ACT® NE-89 etch residue remover is a fluoride containing chemistry specifically formulated for use in etch residue removal and/or controlled etching of contaminated oxide surfaces.
- AI IC Cleans
- China
- Europe
- Japan
- Korea
- Taiwan
- Semiconductors
- ACT®
ACT® NE-89 etch residue remover is a fluoride containing chemistry specifically formulated for use in etch residue removal and/or controlled etching of contaminated oxide surfaces.
ACT® NE-89 etch residue remover is a fluoride containing chemistry specifically formulated for use in etch residue removal and/or controlled etching of contaminated oxide surfaces. This product was designed specifically for single wafer tool processing.
要找到适合的产品,工作量可能会很大。我们的专家可以帮助您找到最适合您需求的解决方案。