TMA is the most widely used aluminum precursor for MOVPE, CVD, or ALD processes for Si semiconductor, LED, III-V solar, Laser diode and other compound semiconductor devices.
- High-k
- Metal Oxides
- China
- Europe
- Japan
- Korea
- Taiwan
- Logic
- Semiconductors
TMA is the most widely used aluminum precursor for MOVPE, CVD, or ALD processes for Si semiconductor, LED, III-V solar, Laser diode and other compound semiconductor devices.
要找到适合的产品,工作量可能会很大。我们的专家可以帮助您找到最适合您需求的解决方案。