DYNASTRIP® DL9150B TMAH-Free Multipurpose Photoresist and Post-Etch Residue Remover

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DYNASTRIP® DL9150B Tetramethylammonium Hydroxide (TMAH)-Free Multipurpose Photoresist and Post-Etch Residue Remover.

Category:
  • Litho Cleans
Locations:
  • China
  • Europe
  • Japan
  • Korea
  • Taiwan
Brands:
  • Dynastrip®

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Product info

Description

DYNASTRIP® DL9150B Tetramethylammonium Hydroxide (TMAH)-Free Multipurpose Photoresist and Post-Etch Residue Remover is a formulated solution designed specifically for the removal of processed photoresists and post-silicon etch residues. It is effective in removing positive or negative (liquid or dry) photoresist or organometallic residues from silicon etch processes (Bosch process).

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